LAUSR

Scanning probe lithography (SPL) as a maskless approach with a low tool price can pattern a variety of materials at a nanometer or even atomic resolution. However, the throughput of conventional SPLs is extremely low due to their limited scanning speeds. Here, we report a high-speed, probe-based method to continuously pattern the substrate surface at a linear velocity of meters per second. We demonstrated direct writings of nanoscale patterns by using ultrafast electron-induced deposition inside a nanoscale flow at a patterning frequency of 20 MHz. The fast scan motion of the writing probe is precisely controlled by using self-adaptive hydro- and aerodynamics functions of a patterning head. The microscale electro-hydrodynamic ejection and microfluid channels are used to deliver the precursor at high scanning speeds. One patterning head can carry parallel probes to further enhance the patterning throughput. This low-cost, maskless patterning method opens new avenues to develop high-throughput nanomanufacturing techniques.