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The deposition of InGaN thin films by plasma-assisted metalorganic chemical vapor deposition is achieved using nitrogen plasma as a nitrogen source. The generation of nitrogen plasma is optimized u... Click to show full abstract
The deposition of InGaN thin films by plasma-assisted metalorganic chemical vapor deposition is achieved using nitrogen plasma as a nitrogen source. The generation of nitrogen plasma is optimized u...
Keywords:
nitrogen;
thin films;
plasma;
plasma assisted;
ingan thin;
nitrogen plasma
Journal Title: AIP Advances
Year Published: 2019
Link to full text (if available)
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Journal Title: AIP Advances
Year Published: 2019
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!