Evolution of Silicon-Nickel Nanosheets on (111) Silicon Substrates to Realize Reduced Graphene Oxide-Silicide Heterostructures
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DOI: 10.1109/led.2019.2936417
Abstract: We report the evolution of ultra-thin silicon-nickel nanosheets on (111) silicon substrates using a hydrogen plasma processing. A novel stress-induced lateral-diffusion method has been employed to realize thin layers of Si-Ni flakes containing nickel quantum… read more here.
Keywords: silicon substrates; silicon; 111 silicon; nickel nanosheets ... See more keywords