This work reports the patterning silicon pillars by metal-assisted chemical etching (MACE) process as a post process on a silicon cantilever for a moisture detection. Although the cantilever is very… Click to show full abstract
This work reports the patterning silicon pillars by metal-assisted chemical etching (MACE) process as a post process on a silicon cantilever for a moisture detection. Although the cantilever is very fragile, the patterning of the pillar structures on the cantilever has been successfully demonstrated. The cantilever coated with a material absorbing water (such as polyimide and mesoporous silica) can use as a humidity sensor. Its bending is due to the surface stress change from water molecule absorption. However, the bending of the cantilever is usually at a small value. Here, the silicon cantilever with high aspect ratio pillars on its surface is proposed, which is expected for a larger bending of the cantilever during the water molecule absorption. The moisture detection utilizes the principle that the pillars stack together based upon the condensation behavior of a water vapor on their surfaces.
               
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