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High‐Performance Ferroelectric–Dielectric Multilayered Thin Films for Energy Storage Capacitors

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This work was supported by: i) the Portuguese Foundation for Science and Technology (FCT) in the framework of the Strategic Funding Contract UID/FIS/04650/2013 and ii) the Project Norte-070124FEDER-000070 Nanomateriais Multifuncionais.… Click to show full abstract

This work was supported by: i) the Portuguese Foundation for Science and Technology (FCT) in the framework of the Strategic Funding Contract UID/FIS/04650/2013 and ii) the Project Norte-070124FEDER-000070 Nanomateriais Multifuncionais. Part of this work was carried out with the support of the Karlsruhe Nano Micro Facility (KNMF), a Helmholtz Research Infrastructure at Karlsruhe Institute of Technology (KIT), under the proposal 2017-017-017030. J.P.B.S. is grateful for financial support through the FCT Grant No. SFRH/ BPD/92896/2013. K.C.S. acknowledges UGC and DST-SERB, Govt. of India for the funds through Grant Nos. F.4-5(59-FRP/2014(BSR)) and ECR/2017/000068, respectively. The authors would also like to thank Engineer Jose Santos for the technical support at the Thin Films Laboratory (Univ. Minho).

Keywords: thin films; ferroelectric dielectric; performance ferroelectric; dielectric multilayered; multilayered thin; high performance

Journal Title: Advanced Functional Materials
Year Published: 2018

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