LAUSR

The interface is the device. As the feature size rapidly shrinks, silicon-based electronic devices are facing multiple challenges of material performance decrease and interface quality degradation. Ultrathin two-dimensional (2D) materials are considered as potential candidates in future electronics by their atomically flat surfaces and excellent immunity to short-channel effects. Moreover, due to naturally terminated surfaces and weak van der Waals (vdW) interactions between layers, 2D materials can be freely stacked without the lattice matching limit to form high-quality heterostructure interfaces with arbitrary components and twist angles. Controlled interlayer band alignment and optimized interfacial carrier behavior allow all-2D electronics based on 2D vdW interfaces to exhibit more comprehensive functionality and better performance. Especially, achieving the same computing capacity of multiple conventional devices with small footprint all-2D devices is considered to be the key development direction of future electronics. Herein, we systemically review the unique properties of all-2D vdW interfaces and their construction methods and summarize the main performance contributions of different vdW interfaces in 2D electronics, respectively. Finally, we discuss the recent progress and challenges for all-2D vdW electronics, pointing out that how to improve the compatibility of 2D material devices with silicon-based industrial technology is a critical challenge. This article is protected by copyright. All rights reserved.