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2D Materials Enabled Next‐Generation Integrated Optoelectronics: from Fabrication to Applications

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Abstract 2D materials, such as graphene, black phosphorous and transition metal dichalcogenides, have gained persistent attention in the past few years thanks to their unique properties for optoelectronics. More importantly,… Click to show full abstract

Abstract 2D materials, such as graphene, black phosphorous and transition metal dichalcogenides, have gained persistent attention in the past few years thanks to their unique properties for optoelectronics. More importantly, introducing 2D materials into silicon photonic devices will greatly promote the performance of optoelectronic devices, including improvement of response speed, reduction of energy consumption, and simplification of fabrication process. Moreover, 2D materials meet the requirements of complementary metal‐oxide‐semiconductor compatible silicon photonic manufacturing. A comprehensive overview and evaluation of state‐of‐the‐art 2D photonic integrated devices for telecommunication applications is provided, including light sources, optical modulators, and photodetectors. Optimized by unique structures such as photonic crystal waveguide, slot waveguide, and microring resonator, these 2D material‐based photonic devices can be further improved in light‐matter interactions, providing a powerful design for silicon photonic integrated circuits.

Keywords: enabled next; fabrication; materials enabled; generation integrated; next generation; silicon photonic

Journal Title: Advanced Science
Year Published: 2021

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