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Ultra‐Steep‐Slope High‐Gain MoS2 Transistors with Atomic Threshold‐Switching Gate

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The fundamental Boltzmann limitation dictates the ultimate limit of subthreshold swing (SS) to be 60 mV dec−1, which prevents the continued scaling of supply voltage. With atomically thin body, 2D… Click to show full abstract

The fundamental Boltzmann limitation dictates the ultimate limit of subthreshold swing (SS) to be 60 mV dec−1, which prevents the continued scaling of supply voltage. With atomically thin body, 2D semiconductors provide new possibilities for advanced low‐power electronics. Herein, ultra‐steep‐slope MoS2 resistive‐gate field‐effect transistors (RG‐FETs) by integrating atomic‐scale‐resistive filamentary with conventional MoS2 transistors, demonstrating an ultra‐low SS below 1 mV dec−1 at room temperature are reported. The abrupt resistance transition of the nanoscale‐resistive filamentary ensures dramatic change in gate potential, and switches the device on and off, leading to ultra‐steep SS. Simultaneously, RG‐FETs demonstrate a high on/off ratio of 2.76 × 107 with superior reproducibility and reliability. With the ultra‐steep SS, the RG‐FETs can be readily employed to construct logic inverter with an ultra‐high gain ≈2000, indicating exciting potential for future low‐power electronics and monolithic integration.

Keywords: high gain; steep slope; mos2; mos2 transistors; gate; ultra steep

Journal Title: Advanced Science
Year Published: 2022

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