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An X‐ray photoelectron spectroscopy (XPS) instrument is utilized for sputter depth profiling of thin films. Relevant instrumental parameters are the ion gun sputter rate, the contamination level of the sputter… Click to show full abstract
An X‐ray photoelectron spectroscopy (XPS) instrument is utilized for sputter depth profiling of thin films. Relevant instrumental parameters are the ion gun sputter rate, the contamination level of the sputter ion gun, and the purity of the sputter ion gun gas supply as well as the vacuum quality of the instrument at the sample position. A long‐term recording of these instrumental parameters ensures the reliability of the measured depth profile data.
Keywords:
instrument;
sputter;
ion gun;
depth profiling;
status monitoring
Journal Title: Surface and Interface Analysis
Year Published: 2020
Link to full text (if available)
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Journal Title: Surface and Interface Analysis
Year Published: 2020
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!