Photo from wikipedia
Tip-based nanolithography provides a flexible nano-lithographic technology. The tip fabrication is the main challenge of the technology. The combination of reactive ion etch and electrochemical machining provides a cost-efficient method… Click to show full abstract
Tip-based nanolithography provides a flexible nano-lithographic technology. The tip fabrication is the main challenge of the technology. The combination of reactive ion etch and electrochemical machining provides a cost-efficient method for tip fabrication with nanoscale tip openings. In this paper, we investigated the effects of different photoresist thicknesses and electrochemical machining times on tip fabrication. We have successfully fabricated the size of tip opening with the dimension less than 100 nm. Meanwhile, we have demonstrated the tip opening by performing lithography. After UV exposure and development, the chromium dot-array patterns with the diameter of 600 nm were obtained.
Journal Title: Microsystem Technologies
Year Published: 2017
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!