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Effect of SmFeO3 content on structure and multiferroic properties of mSmFeO3–Bi4Ti3O12 thin films

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mSmFeO3–Bi4Ti3O12 (m = 0.5, 1.0, 1.5, 2.0) thin films were prepared on silicon wafer by sol–gel progress. Their structure, leakage current density, ferroelectricity, magnetism, and dielectric property were investigated. All the samples… Click to show full abstract

mSmFeO3–Bi4Ti3O12 (m = 0.5, 1.0, 1.5, 2.0) thin films were prepared on silicon wafer by sol–gel progress. Their structure, leakage current density, ferroelectricity, magnetism, and dielectric property were investigated. All the samples have a single-phase Aurivillius structure. The interplanar spacing and volume of the unit cell decrease with the increase of SmFeO3 content. Moreover, the multiferroic properties have been significantly improved, with 2Prmax ~ 62 μC/cm2 (m = 0.5) and Msmax ~ 5.8 emu/cm3 (m = 2) at room-temperature. The samples with m = 0.5, 1, 1.5 exhibit Ohmic mechanism-dominated conductive behavior, however, for m = 2 sample, the space-charge-limited current mechanism becomes dominant. The dielectric constant εr of the thin films at 1 MHz for m = 0.5, 1.0, 1.5 and 2.0 are 498, 485, 272, and 217 respectively.

Keywords: thin films; msmfeo3 bi4ti3o12; smfeo3 content; multiferroic properties; structure; bi4ti3o12 thin

Journal Title: Journal of Materials Science: Materials in Electronics
Year Published: 2019

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