mSmFeO3–Bi4Ti3O12 (m = 0.5, 1.0, 1.5, 2.0) thin films were prepared on silicon wafer by sol–gel progress. Their structure, leakage current density, ferroelectricity, magnetism, and dielectric property were investigated. All the samples… Click to show full abstract
mSmFeO3–Bi4Ti3O12 (m = 0.5, 1.0, 1.5, 2.0) thin films were prepared on silicon wafer by sol–gel progress. Their structure, leakage current density, ferroelectricity, magnetism, and dielectric property were investigated. All the samples have a single-phase Aurivillius structure. The interplanar spacing and volume of the unit cell decrease with the increase of SmFeO3 content. Moreover, the multiferroic properties have been significantly improved, with 2Prmax ~ 62 μC/cm2 (m = 0.5) and Msmax ~ 5.8 emu/cm3 (m = 2) at room-temperature. The samples with m = 0.5, 1, 1.5 exhibit Ohmic mechanism-dominated conductive behavior, however, for m = 2 sample, the space-charge-limited current mechanism becomes dominant. The dielectric constant εr of the thin films at 1 MHz for m = 0.5, 1.0, 1.5 and 2.0 are 498, 485, 272, and 217 respectively.
               
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