LAUSR

Experimental parameters have direct influences on materials properties and therefore their applications. The effect of plasma power on the properties of cobalt oxide thin films, prepared using plasma-enhanced chemical vapor deposition technique, on stainless steel substrates have been addressed in this paper. The structural, morphological, and compositional properties of these films were investigated by means of X-ray diffraction (XRD), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS) technique. The XRD patterns demonstrated the growth of polycrystalline Co3O4 thin film with a cubic spinel structure such that the intensity of (511) and (311) peaks increase as the plasma power increases to 100 W. It is observed that crystallite size increases by increasing the plasma power and the maximum crystallite size is found to be 64.8 nm for 100 W. The AFM results illustrate that the surface roughness and grain size increase by increasing the plasma power, and the film deposited at lower plasma power has more uniform and smoother surface, mainly owing to the increase in surface diffusion that in turn causes the coalescence of the grains. The results of XPS spectra indicated the formation of Co3O4 thin films on stainless steel substrates and there were no other elements other than Co, O in the XPS spectra. Additionally, stereometric analysis and fractal dimension of the 3-D surface microtexture of the AFM micrographs were analyzed and the Kolmogorov–Smirnov test was used to assess the normal distribution of quantitative variables. The results of statistical analysis corroborated the experimental results and proved that the surface roughness increased upon an increase in plasma power. Moreover, the corrosion behavior and the surface morphology of the cobalt oxide thin films were investigated using the potentiodynamic method and scanning electron microscopy. The results of these analysis proved that as the plasma power increases the corrosion resistance improves against the H2SO4. The sample which deposited at 100 W plasma power has the minimum corrosion current and the corrosion resistance of steel substrate was improved by controlling the anodic reactions resulted from a protective Co3O4 thin film. These results are useful for building and designing stainless steel devices in corrosive environments.