LAUSR

In the present work, The SiO2, and CoS2–SiO2 nanomaterials and incorporated on chitosan was developed as photocatalyst for photocatalytic degradation of toxic compound such as ethidium bromide as a hazard mutagenic pollutant. The SiO2, and CoS2–SiO2 nanomaterials were prepared using the sol–gel/sonochemical method. Therefore, the nano photocatalyst were characterized by various analytical devices such as scanning electron microscopy (SEM), X-ray diffraction and photoelectron (XRD and XPS) analysis, energy dispersive X-ray spectrometer (EDS), UV–Vis absorption spectroscopy and dynamic light scattering, in order to attain the structural properties. The average crystallite size values of SiO2, CoS2–SiO2, and CoS2–SiO2/Chitosan nanocomposites are 0.63, 40.28, and 69.75 nm, respectively. The band-gap values was obtained 8.9–2.7 eV for SiO2, CoS2–SiO2, and CoS2–SiO2/Chitosan nanocomposites, respectively. The photocatalytic performances of the three prepared nano-photocatalyst were examined by UV-light with help the photo-degradation of ethidium bromide. The CoS2–SiO2/Chitosan nanocomposites photocatalyst shows the high amount of photocatalytic degradation (96.00%) in comparison to SiO2, and CoS2–SiO2 nanomaterials. The results demonstrated that the all prepared nano-photocatalyst under UV irradiation was in pH 5 at 40 min. The antifungal and antibacterial of the SiO2, CoS2–SiO2, and CoS2–SiO2/Chitosan were examined. The CoS2–SiO2/Chitosan (high 11.00 mm inhibition zone) has appropriate antimicrobial activity compared with pure SiO2.