We demonstrate a novel solution growth method for synthesis of uniform and ordered periodic mesoporous organosilica (PMO) thin films on substrate. The approach is simple and facile, in which a… Click to show full abstract
We demonstrate a novel solution growth method for synthesis of uniform and ordered periodic mesoporous organosilica (PMO) thin films on substrate. The approach is simple and facile, in which a substrate is immersed into a solution containing 1,2-bis(triethoxysilyl)ethane (BTSE) precursor, cetyltrimethylammonium bromide (CTAB) surfactant template, ammonia catalyst, ethanol, and decane. The precursors are hydrolyzed, cross-linked by ammonia catalyst, and assembled with the surfactant on the substrate to form highly ordered hexagonal mesostructures. The obtained mesoporous silica films possess substrate-size-dependent dimension, uniform and tunable thickness (30–100 nm), and ethane group incorporated frameworks. The obtained PMO films have been characterized by field-emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM), and grazing incidence small-angle X-ray scattering (GISAXS). The film thickness can be easily controlled by adjusting the reaction temperature. A formation mechanism of the ethane-bridged PMO films via CTAB directed sol–gel process is further proposed.
               
Click one of the above tabs to view related content.