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Hard and optically transparent nanocomposite Al-Si-N thin films were deposited using DC magnetron sputtering at different process parameters. There was a significant effect of these parameters on the film properties… Click to show full abstract
Hard and optically transparent nanocomposite Al-Si-N thin films were deposited using DC magnetron sputtering at different process parameters. There was a significant effect of these parameters on the film properties affecting its mechanical and optical behavior. The nitrogen content or pressure, deposition pressure and substrate temperature strongly influence the phase formation which governs the hardness and optical transparency of the coating. Hardness was measured between 18 and 30 GPa. The band gap could be varied in the range of 3.8-4.2 eV by varying nitrogen pressures in the chamber during deposition. The films showed (0-80)% transparency in UV and visible region depending on the sputtering conditions.
Journal Title: Journal of Materials Engineering and Performance
Year Published: 2018
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