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Using a fast dual-wavelength imaging ellipsometric system to measure the flow thickness profile of an oil thin film

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Abstract Dual-wavelength light sources with stroboscopic illumination technique were applied in a process of photoelastic modulated ellipsometry to retrieve two-dimensional ellipsometric parameters of thin films on a silicon substrate. Two… Click to show full abstract

Abstract Dual-wavelength light sources with stroboscopic illumination technique were applied in a process of photoelastic modulated ellipsometry to retrieve two-dimensional ellipsometric parameters of thin films on a silicon substrate. Two laser diodes were alternately switched on and modulated by a programmable pulse generator to generate four short pulses at specific temporal phase angles in a modulation cycle, and short pulses were used to freeze the intensity variation of the PEM modulated signal that allows ellipsometric images to be captured by a charge-coupled device. Although the phase retardation of a photoelastic modulator is related to the light wavelength, we employed an equivalent phase retardation technique to avoid any setting from the photoelastic modulator. As a result, the ellipsometric parameters of different wavelengths may be rapidly obtained using this dual-wavelength ellipsometric system every 4 s. Both static and dynamic experiments are demonstrated in this work.

Keywords: ellipsometric system; dual wavelength; fast dual; using fast; wavelength

Journal Title: Applied Surface Science
Year Published: 2017

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