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The influence of preparation conditions on structural evolution and electrochemical properties of sputtered LiNi 0.5 Mn 1.5 O 4 thin film electrodes

Abstract LiNi0.5Mn1.5O4 (LNMO) thin films were prepared by radio frequency magnetron sputtering, followed by thermal annealing in ambient atmosphere. The growth of the films has been studied as a function… Click to show full abstract

Abstract LiNi0.5Mn1.5O4 (LNMO) thin films were prepared by radio frequency magnetron sputtering, followed by thermal annealing in ambient atmosphere. The growth of the films has been studied as a function of deposition temperature, atmosphere, and annealing temperature. Electrochemical properties of LNMO thin-film cathodes were investigated using galvanostatic charge/discharge and cyclic voltammetry against a lithium anode. The initial capacity and capacity retention of the films are highly dependent on the crystallinity and morphology of the films. LNMO thin film grown at 400 °C in an Ar/O2 atmosphere and annealed at 550 °C exhibits good crystallinity and well-defined grain structure. Also it exhibits larger capacity and higher cyclic stability under a high cutoff voltage of 4.9 V.

Keywords: electrochemical properties; lnmo thin; thin film; influence preparation; preparation conditions; film

Journal Title: Applied Surface Science
Year Published: 2017

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