Abstract This study grew nitrogen doped ultrananocrystalline diamond (N-UNCD) conductive layer on InGaN-based light emitting diodes (LEDs) using the concave nanopattern (CNP) enhanced nucleation. The low nucleation density of the… Click to show full abstract
Abstract This study grew nitrogen doped ultrananocrystalline diamond (N-UNCD) conductive layer on InGaN-based light emitting diodes (LEDs) using the concave nanopattern (CNP) enhanced nucleation. The low nucleation density of the N-UNCD on bare LEDs (Br-LED) resulted in an island morphology. The nucleation density of the N-UNCD increased significantly from 1.8 × 108 cm−2 for Br-LED to 3.6 × 109 cm−2 for LEDs with a CNP density of 6.1 × 109 cm−2 (CNP-LED). The N-UNCD preferred to nucleate inside the CNP during the initial growth stage. The N-UNCD islands then merged and grew laterally to form a continuous thin film within a thickness of 300 nm. The N-UNCD/CNP-LED exhibited a stable electroluminescence peak wavelength of ~447.1 nm in the injection current range of 10–100 mA. The decrease in the compressive stress due to removing the p-GaN layer (i.e. the CNP structure) resulted in a quantum confined Stark effect (QCSE) mitigation in the multi-quantum wells (MQWs). In addition, the lower turn on voltage caused a lower electric field in the MQWs and diminished the screen of the QCSE. The N-UNCD prepared by the proposed nucleation technique demonstrated a promising conductive layer for InGaN-based LEDs.
               
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