LAUSR.org creates dashboard-style pages of related content for over 1.5 million academic articles. Sign Up to like articles & get recommendations!

New insights into the mechanism of photodegradation of chitosan.

Photo from archive.org

Chitosan films were subjected to accelerated artificial weathering at λ>300 nm and 60 °C in the presence of O2. The resulting variations in the chemical structure were characterized by IR… Click to show full abstract

Chitosan films were subjected to accelerated artificial weathering at λ>300 nm and 60 °C in the presence of O2. The resulting variations in the chemical structure were characterized by IR spectroscopy and UV-vis spectroscopy, and a photooxidation mechanism was proposed based on the identified oxidation photoproducts. The formation of gluconolactone derivatives leading to chain scissions was shown. In addition, low molecular weight photoproducts, which accounted for chitosan deacetylation, were detected. Furthermore, crosslinking reactions occurred, as revealed by gel fraction characterization. Variations in the mechanical and surface properties were characterized by AFM, and the reduction in macroscopic properties was correlated with the structural changes observed at the molecular scale by a multiscale approach.

Keywords: mechanism; mechanism photodegradation; photodegradation chitosan; spectroscopy; new insights; insights mechanism

Journal Title: Carbohydrate polymers
Year Published: 2021

Link to full text (if available)


Share on Social Media:                               Sign Up to like & get
recommendations!

Related content

More Information              News              Social Media              Video              Recommended



                Click one of the above tabs to view related content.