LAUSR

Abstract In this study, amorphous MoO x films and Ag metal films were deposited on soda-lime glass via a sputtering system at room temperature. The experimental results indicate that MoO x films prepared with a 6% O 2 /Ar flow rate exhibit an amorphous phase with high transparency and an optical band gap of 2.7 eV. In-situ O 2 /Ar plasma was adopted to further modify the surface of the Ag mid-layer after deposition. This approach can enhance the visible transmittance of MoO x and Ag-based multilayers with the same sheet resistance. The polygrains oriented along the (111) and (200) directions in the inserted Ag thin films were adopted to supply carriers into the MoO x film and decrease the sheet resistance of the MoO x and Ag-based multilayer. The multilayer structure exhibited a sufficiently large Ag thickness (>10 nm), low resistance, and visible transmittance to serve as a transparent conductive electrode. The dependence of the Ag thickness, MoO x thickness, and plasma treatment time on the optical and electrical properties of Ag/MoO x and symmetric MoO x /Ag/MoO x were also explored. A figure of merit (FOM) of 5.3×10 −2  (Ω −1 ) was achieved at the visible wavelength of 550 nm for a MoO x /Ag/MoO x stacked layer with a 10-nm-thick Ag layer and a 30-nm-thick MoO 3 layer. Such a MoO x /Ag/MoO x stacked structure might be a promising electrode in potential applications of transparent conductive oxides.