Abstract High quality smooth, uniform and crack-free ceria and gadolinium doped ceria (GDC) thin films were prepared on Si and Si/YSZ substrates by chemical solution deposition. The thermal behavior of… Click to show full abstract
Abstract High quality smooth, uniform and crack-free ceria and gadolinium doped ceria (GDC) thin films were prepared on Si and Si/YSZ substrates by chemical solution deposition. The thermal behavior of Gd-Ce-O precursor was investigated by TG-DSC measurements. The phase purity and structure of deposited films were evaluated using X-ray diffraction (XRD) analysis and Raman spectroscopy. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were employed for the estimation of surface morphological features. Oxidation state of Ce ions in fabricated films was analyzed by X-ray photoelectron spectroscopy (XPS). Optical properties were evaluated by diffuse reflectance UV–vis spectrometry. Thickness of the films can be controlled by applying a certain number of spin coating cycles. A linear relation between the thickness of the films and the number of deposited layers was observed. The single-layer thickness was determined to be approximately 20 nm. The influence of annealing temperature and Gd content on the film structure, morphology and optical properties was studied and discussed. The dependence of an optical band gap as a function of grain size was demonstrated.
               
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