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Deposition and characterization of epitaxial Ta-doped TiO2 films for ultraviolet photoelectric detectors

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Abstract Undoped and tantalum-doped titania (TiO2:Ta) films were synthesized via metalorganic chemical vapor deposition (MOCVD). The crystallization qualities, surface morphologies and optical properties of the deposited films were systematically characterized.… Click to show full abstract

Abstract Undoped and tantalum-doped titania (TiO2:Ta) films were synthesized via metalorganic chemical vapor deposition (MOCVD). The crystallization qualities, surface morphologies and optical properties of the deposited films were systematically characterized. The results indicated that the films having low doping levels were epitaxial anatase titania along [001] orientation with high transparency in visible region. The optical band gap could be modulated from 3.38 to 3.52 eV by controlling Ta doping levels. Ultraviolet (UV) photoelectric detectors with metal-semiconductor-metal (MSM) structure were designed and fabricated based on the undoped and Ta-doped films. The maximum spectral response of 32.3 A/W was detected at about 315 nm for the 1% Ta-doped TiO2 film-based detector. The detectors based on the undoped and 1% Ta-doped TiO2 films also presented good temporal responses and visible-blind characteristics, showing excellent UV light detection performances.

Keywords: tio2 films; deposition characterization; doped tio2; photoelectric detectors; characterization epitaxial; ultraviolet photoelectric

Journal Title: Ceramics International
Year Published: 2018

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