LAUSR

Abstract Lithium niobate LiNbO3 (LN) on insulator wafers (LNOI) representing a submicron-thick LN film bonded to a SiO2 layer deposited on a thick LN substrate have been manufactured recently by ion slicing. Today, LNOI is one of the most promising materials for fabrication of various integrated optical devices, including waveguides, electro-optical modulators, and wavelength convertors, due to their high drop in refractive index at the interface between the film and the SiO2 layer. Creation of the stable domain structures with submicron periods in LNOI will improve the properties of nonlinear optical devices. Periodically poled LN with periods below 300 nm can be used to implement an optical parametric oscillator in the backward configuration. We have studied experimentally the ways to create the stripe domains and periodical domain structures in LNOI with a dielectric layer under the film by local switching. The identified scenarios of the domain evolution were attributed to the ineffective screening of depolarization field. We have shown that stripe domains and periodic domain structures can be produced by scanning with a biased tip only at temperatures above 80 °C. Periodical stable domain structures with periods down to 300 nm have been created.