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Semiconductor wastewater currently contains H2O2 which is an important reagent in wafers cleaning. Recalcitrant organic pollutant such as EDTA are always present in this type of wastewater and may represent… Click to show full abstract
Semiconductor wastewater currently contains H2O2 which is an important reagent in wafers cleaning. Recalcitrant organic pollutant such as EDTA are always present in this type of wastewater and may represent a threat for the environment. In this work, a new photoelectrochemical reactor is proposed to remove EDTA from H2O2 contaning wastewater. First, photolysis, electrochemical peroxidation and photo-electrochemical peroxidation were compared. The results showed that the removal efficiency decreases in the sequence: UV/H2O2 «EC/H2O2
Journal Title: Chemosphere
Year Published: 2018
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