LAUSR

Abstract The Er:NiO nanostructured thin films were fabricated using the spray pyrolysis method with 0.0, 2.5 and 5.0 wt.% dopant contents. Structural phase analysis of films reveals cubic structures with preferential growth along (111) plane at angle 2θ ~ 37.41°. Optical investigation of as-prepared films reveals redshift in optical bandgap (Eg) with an increase in Er contents due to the reduction of transparency in the visible region. The obtained Eg values are reduced from 3.95 to 3.80 eV with Er contents. The calculated values of χ 3 and n 2 were found between 1.81 × 10−15 to 4.56 × 10−11 esu and 5.13 × 10−14 to 5.45 × 10−10 esu, respectively. The prepared films are more suitable for optoelectronic applications due to the high transparency and Eg.