LAUSR

Abstract Thin protective films have been widely used for metal anticorrosion application. However, previous films either negatively influence the photoelectric property of metal surfaces or exhibit poor corrosion resistance. In this paper, an ultrathin adsorption film is built up through the effective use of linear/stereoscopic organosilicon. This kind of film is formed by the good 3-D shielding structure of a silicon resin and a linear oxosilane. Small molecule corrosion inhibitors fill the interstitial sites, leading to a compact composite structure. This film has little effect on the photoelectric property of the metal surface. Copper covered with this film achieves a contact angle of 118°and a protective efficiency of 99.34%, both of which are much higher than the previously reported for protective thin films. Moreover, such films could be adapted for various metal materials.