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Effects of buffer gas on N-doped graphene in a non-thermal plasma process

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Abstract A non-thermal plasma process based on a magnetically stabilized gliding arc discharge (MSGAD) at atmospheric pressure is developed for the synthesis of nitrogen-graphene nano-flakes (N-GNFs). Using propane as a… Click to show full abstract

Abstract A non-thermal plasma process based on a magnetically stabilized gliding arc discharge (MSGAD) at atmospheric pressure is developed for the synthesis of nitrogen-graphene nano-flakes (N-GNFs). Using propane as a precursor, N-GNFs with low relative amounts of bonded oxygen, large specific surface area (200–500 m2/g) and nitrogen doping level of 1–3% are produced by adjusting the buffer gas of the reaction system. N-doping is confirmed by X-ray photoelectron spectroscopy, Raman spectroscopy, and elemental CNHSO analysis. The effects of buffer gas on N-GNFs are investigated. It is found that the nitrogen configuration is always dominated by pyrrolic nitrogen. A high nitrogen flow rate with a total flow rate constant promotes a higher doping level of N, but more defects appear. The addition of NH3 or H2 further increases the nitrogen doping level, and eliminates some defects. Different buffer gases lead to different types and concentrations of active species, which is a key factor in the synthesis of nitrogen-doped graphene.

Keywords: thermal plasma; spectroscopy; buffer gas; non thermal; plasma process

Journal Title: Diamond and Related Materials
Year Published: 2021

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