LAUSR

Abstract Chemical lift-off lithography (CLL) on Au and indium tin oxide (ITO) were investigated using electrochemical methods in terms of the coverage, stability, and substrate-dependence. Self-assembled monolayers (SAMs) of 11-mercaptoundecanol (MUO) on Au and hydroxyundecylphosphonic acid (HUPA) on ITO were patterned by an oxygen plasma-activated PDMS stamp. Siloxyl groups (Si OH) from the activated PDMS formed covalent bonds with the hydroxyl groups of the SAM ( OH) on the Au and ITO substrate, which enables the detachment of the SAM molecules from the surface, called CLL. The interfacial properties of the SAM-modified electrodes and post-CLL electrodes were investigated with cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS). The results revealed that ca. 78% of the SAM on Au is detached by CLL and the remaining SAM is stable during subsequent SAM formations. For alkanephosphonic acid on ITO, ca. 57% of the SAM was removed in terms of electrochemistry indicating the dependence of CLL on the anchoring groups. AFM images show the pattern formation by CLL on both Au and ITO.