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Photoelectrochemical characteristics of electrodeposited cuprous oxide with protective over layers for hydrogen evolution reactions

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Abstract Cuprous oxide is one of the inexpensive options of highly efficient visible light-based photocathode for hydrogen generation in photoelectrochemical cells. Highly photoactive cuprous oxide (Cu2O) films are obtained by… Click to show full abstract

Abstract Cuprous oxide is one of the inexpensive options of highly efficient visible light-based photocathode for hydrogen generation in photoelectrochemical cells. Highly photoactive cuprous oxide (Cu2O) films are obtained by cathodic electrodeposition using lactate stabilized copper sulphate precursor exhibiting a photo-current density of ~1 mA/cm2 at −0.1 V vs. RHE. Although Cu2O is a decent choice for photoelectrochemical applications, including hydrogen evolution reaction (HER), it faces serious issues related to photodegradation and instability. To address this issue, a comparative study of two types of thin films, Al (2%)-doped ZnO (AZO) and NiOx (usually, x > 2 at low T to x→1 at high T annealing) as photo-corrosion protective overlayers is made. The improved stability of the protected photoelectrodes is observed as noted from the photocurrent degradation of 3.5%, 0.16% and 0.03% in Cu2O (bare), Cu2O/AZO, and Cu2O/NiOx photocathodes, respectively. Furthermore, the electrochemical impedance spectroscopy reveals that electrode protected with NiOx exhibit faster charge transfer kinetics and minimum photocurrent degradation as compare to the Cu2O/AZO and Cu2O(bare) photoelectrodes, proving its potential in HER kinetics.

Keywords: cuprous oxide; hydrogen evolution; cu2o; characteristics electrodeposited; photoelectrochemical characteristics

Journal Title: International Journal of Hydrogen Energy
Year Published: 2020

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