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Abstract WO3 thin films are prepared by electron beam evaporation (EBE) technique under the base pressure of 2 × 10-5 mbar at various substrate temperature (Ts) ranging from room temperature (RT) to… Click to show full abstract
Abstract WO3 thin films are prepared by electron beam evaporation (EBE) technique under the base pressure of 2 × 10-5 mbar at various substrate temperature (Ts) ranging from room temperature (RT) to 450 °C. The deposited films were characterized systematically to analyse the influence of substrate temperature on structural, morphological, compositional, vibrational, electrical, optical and electrochromic properties. The EDS data of deposited films confirm the presence of tungsten (W) and Oxygen (O) elements. XRD spectra reveal that films deposited at Ts
Journal Title: Optik
Year Published: 2018
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