Abstract First-principles calculations were performed to study the adhesion of the M alloyed TiAl and TiO 2 interface (M = Si, Cr, Co, Ni, Y, Zr, Nb, Mo, Pd, and W). The… Click to show full abstract
Abstract First-principles calculations were performed to study the adhesion of the M alloyed TiAl and TiO 2 interface (M = Si, Cr, Co, Ni, Y, Zr, Nb, Mo, Pd, and W). The occupation of alloying elements in the TiAl/TiO 2 interface was examined and the influence of alloying elements on the adhesion of the interface was then clarified. The alloying elements stabilize both the TiAl surface and TiAl/TiO 2 interface but with different degrees.The Y, Nb and Pd greatly improve the adhesion of TiO 2 on TiAl matrix, while others illustrate relatively weak effect. The geometric configuration and electronic structures of elements in the interface zone were studied to investigate the bonding interactions between the alloyed TiAl and TiO 2 layers. The oxygen atoms are found to be the adhesion media connecting the alloyed TiAl and TiO 2 slabs in the TiAl/TiO 2 interface and may affect the spallation of oxide scale from TiAl matrix.
               
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