Abstract In this work, rutile titanium dioxide (TiO 2 ) films were prepared on quartz and SiO 2 /Si substrates utilizing RF magnetron reactive sputtering technology. Crystal structure, surface morphology… Click to show full abstract
Abstract In this work, rutile titanium dioxide (TiO 2 ) films were prepared on quartz and SiO 2 /Si substrates utilizing RF magnetron reactive sputtering technology. Crystal structure, surface morphology and optical property of these films were characterized to verify the obtainment of well crystalline rutile TiO 2 films. The dynamics of photocarriers were studied by using temporally resolved transient absorption measurements. The differential reflectivity as a function of pump fluence was investigated. We also directly obtained a carrier lifetime of about 286 ps. The absorption cross-section and the absorption coefficient of free carrier at 800 nm were 1.87 × 10 −17 cm 2 and 32.9 cm −1 , respectively.
               
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