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Abstract In this paper, a fabrication method for a patterned (Ba0.67Sr0.33TiO3, BST/LaNiO3, LNO)n thin-film multilayer is reported. The multilayer films were deposited by radio-frequency (RF) magnetron sputtering. A patterning technique… Click to show full abstract
Abstract In this paper, a fabrication method for a patterned (Ba0.67Sr0.33TiO3, BST/LaNiO3, LNO)n thin-film multilayer is reported. The multilayer films were deposited by radio-frequency (RF) magnetron sputtering. A patterning technique of the as-prepared multilayer thin films was developed using ultrasonic-assisted wet etching. The scanning electron microscopy (SEM) surface images show that the developed technique can effectively etch the multilayer thin films deposited on SiO2 and Pt substrates without any residues. The etched multilayer thin film units of the size of 50 μm × 50 μm display clear and smooth etching edges, low distortions ( 900) and a relatively low loss tangent (
Journal Title: Journal of Alloys and Compounds
Year Published: 2019
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