LAUSR.org creates dashboard-style pages of related content for over 1.5 million academic articles. Sign Up to like articles & get recommendations!

Accelerating the oxidation rate of AlN substrate through the addition of water vapor

Photo from wikipedia

Abstract To apply a pre-oxidation treatment on aluminum nitride (AlN) substrate is a common practice before its metallization. In the present study, the microstructure of AlN after oxidation either in… Click to show full abstract

Abstract To apply a pre-oxidation treatment on aluminum nitride (AlN) substrate is a common practice before its metallization. In the present study, the microstructure of AlN after oxidation either in dry air or in wet air is characterized. The resulting thermal conductivity is measured. With or without the presence of water vapor, the oxidation of AlN is a reaction-dominating process. The addition of water vapor speeds up the oxidation rate by one order of magnitude. The surface oxide layer is full of nano-sized pores. The presence of surface oxide reduces the thermal conductivity by ∼15% when the thickness of oxide layer is only 3 μm.

Keywords: water vapor; aln substrate; addition water; oxidation

Journal Title: Journal of Asian Ceramic Societies
Year Published: 2017

Link to full text (if available)


Share on Social Media:                               Sign Up to like & get
recommendations!

Related content

More Information              News              Social Media              Video              Recommended



                Click one of the above tabs to view related content.