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Photoelectrochemical degradation of bisphenol A using Cu doped WO3 electrodes

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Abstract Cu-doped WO3 electrode was fabricated on FTO substrate via one step preparation by modified sol-gel method using a suspension of [(NH4)10H2(W2O7)6] and CuSO4·5H2O in mix of polyethylene glycol 300… Click to show full abstract

Abstract Cu-doped WO3 electrode was fabricated on FTO substrate via one step preparation by modified sol-gel method using a suspension of [(NH4)10H2(W2O7)6] and CuSO4·5H2O in mix of polyethylene glycol 300 and ethylene glycol. Photoelectrocatalytic degradation of bisphenol A (BPA) with Cu-doped WO3 electrode was performed under visible light irradiation and H2O2 as auxiliary oxidizing agent. For monitoring of the photoelectrocatalysis it was used conventional and alternative method (UV–Vis spectrophotometry and electrochemical sensor, respectively). After 8 h of assay, it was verified removal of 80% of BPA and formation of the phenolic intermediates using electrochemical sensor and 75% of total carbon organic removal.

Keywords: doped wo3; degradation bisphenol; photoelectrochemical degradation; bisphenol using

Journal Title: Journal of Electroanalytical Chemistry
Year Published: 2019

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