LAUSR

Abstract We have systematically studied the effect of oblique angle deposition (OAD) on the transport properties of Permalloy (Ni81Fe19) thin films. Films deposited at oblique angles larger than 50° exhibit a resistivity minimum that can be further manipulated by changing the oblique angle. A minimum in temperature dependent resistivity is manifested as a deviation from the usual phonon-scattering behavior. Furthermore, a change in the magnetic anisotropy in the films is clearly demonstrated in their magnetoresistance that shifts from negative to positive with increasing glancing angle. OAD results in the formation of columns-like microstructures on the films, while their porosity greatly enhances. The microstructural evolution induced by OAD modifies the fundamental electron scattering process in the films. The modifications in the scattering mechanism outcomes in a resistivity minimum in the films grown at high oblique angles. The possible mechanisms responsible for the observed behavior are discussed.