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Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries

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Abstract The use of Ti phosphate as a functional coating for Li ion battery electrodes has been investigated, as well as the effect of nitrogen doping on its electrochemical properties.… Click to show full abstract

Abstract The use of Ti phosphate as a functional coating for Li ion battery electrodes has been investigated, as well as the effect of nitrogen doping on its electrochemical properties. First, previous knowledge on PE-ALD of Ti phosphate (using an exposure sequence of trimethylphosphate plasma–oxygen plasma–titaniumisopropoxide) was used to study an altered process using a nitrogen plasma, i.e. TMP* - N2* - TTIP. This enabled the deposition of a nitrogen doped (6 at.%) Ti phosphate with a growth per cycle of 0.4 nm/cycle. Next, a dual-source precursor (diethylphosphoramidate plasma, or DEPA*) was introduced instead of TMP*, allowing for a higher growth rate (0.6 nm/cycle) and a higher nitrogen level (8.6 at.%). The ionic transparency of the phosphate slightly decreased due to nitrogen incorporation, but the effective transversal electronic conductivity showed to be three times higher after nitrogen doping. A 2 nm coating of (un)doped Ti phosphate significantly improved the rate capability of a lithium nickel manganese cobalt oxide (NMC) electrode, increasing the amount of energy that can be stored at high (dis)charging speeds with a factor 10 (at 5C). In addition, the undoped titanium phosphate coating offered increased stability, retaining 84% of the capacity after 100 cycles at 1C with respect to 79% for the uncoated electrode.

Keywords: phosphate; nitrogen doped; deposition nitrogen; doped phosphate; nitrogen; coating

Journal Title: Journal of Power Sources
Year Published: 2021

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