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Abstract The results of real-time in-situ spectroscopic investigation of copper films growth are presented. The films were deposited on fused silica substrates by magnetron sputtering. Three growing stages of copper… Click to show full abstract
Abstract The results of real-time in-situ spectroscopic investigation of copper films growth are presented. The films were deposited on fused silica substrates by magnetron sputtering. Three growing stages of copper films were in-situ, ex-situ analysed and compared with modelled values. The minimum continuous film thickness of about 10 nm was determined by such comparison. This new empirical method might be applied for multilayer coatings deposition.
Keywords:
real time;
films growth;
copper;
investigation copper;
time situ
Journal Title: Materials Letters
Year Published: 2018
Link to full text (if available)
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Journal Title: Materials Letters
Year Published: 2018
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!