LAUSR

In this paper we present the design, technology and application of Si/Si3N4 micro calibration stage equipped with Pt microheaters. This 500nm thick MEMS structure with 4 independently controlled microheaters allows for precise control temperature dissipation and contact between surface and tip of cantilever. Localization on thin, low thermally conductive membrane minimizes the heat transfer to the bulk silicon. In order to increase mechanical stability of the structure, the membrane is supported by the tip. Structure stiffness is increased which allows for characterization of relatively stiff (3070Nm1) piezoresistive scanning thermal microscopy probes. The small size and spatial arrangement of independent heaters allows for the controlled heat flow in the membrane and measurements of the temperature distribution. Display Omitted MEMS structure with 4 microheaters allows for precise control the temperature dissipation and SThM tip-membrane contactSupporting tip increases the stiffness of the structure without drop of the membrane-chip thermal resistanceNot parasitic heating of the microscope head (in contrary to standard Pt-100 based structures)Flexible platform for various experiments with locally controlled heat sources and temperature sensors