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Nanostructuring methylammonium lead iodide perovskite by ultrafast nano imprinting lithography

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We report the nanopatterning of the methylammonium lead iodide (MAPbI3) perovskite, a polycrystalline hybrid organic-inorganic semiconductor with very promising perspectives for photovoltaic and optoelectronic applications. Nanopatterning of MAI is obtained… Click to show full abstract

We report the nanopatterning of the methylammonium lead iodide (MAPbI3) perovskite, a polycrystalline hybrid organic-inorganic semiconductor with very promising perspectives for photovoltaic and optoelectronic applications. Nanopatterning of MAI is obtained via Pulsed-NIL technology, an ultrafast version of the thermal nanoimprint lithography (NIL) based on stamps with integrated heaters. By Pulsed-NIL we were able to replicate onto the hybrid perovskite structures with details at the sub-100nm scale, in spite of its crystalline nature. This work shows a new possibility for the exploitation of organo-metal halide perovskites in optoelectronic devices with more complex architectures than just planar films. Display Omitted Methylammonium lead iodide thin film nanoimprinting approach is proposed.V-groove nanostructures are transferred to the photoactive material via Pulsed-NIL.The technique allows to perform the step in less than 1s.The preliminary trials show the possibility to scale up the process.

Keywords: methylammonium lead; pulsed nil; lithography; lead iodide; nanostructuring methylammonium

Journal Title: Microelectronic Engineering
Year Published: 2017

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