Abstract Ultrasonication vibration as the pretreatment process, combined with wet acid etching, was utilized for the texture of diamond wire sawn (DWS) multi-crystalline silicon wafers. The SiC particles in the… Click to show full abstract
Abstract Ultrasonication vibration as the pretreatment process, combined with wet acid etching, was utilized for the texture of diamond wire sawn (DWS) multi-crystalline silicon wafers. The SiC particles in the ultrasonic device were imposed for cavitation-generating blasting action on the DWS wafers surfaces. The blasting action exceeding 5 min can remove saw marks and smooth zones on the DWS wafer surfaces by producing new pits. After wet acid etching,the texture morphology of ultrasonically pretreated DWS mc-silicon wafers was quite uniform as compared to wet-textured as-cut DWS mc-silicon wafers, similar to wet-textured slurry wire saw(SWS) mc-silicon wafers. Light reflectivity tests confirmed the beneficial effect of the ultrasonic pretreatment of DWS mc-silicon wafers. This technique could be a potential solution to the texturization problem of DWS mc-silicon wafers.
               
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