Abstract In this paper electrical analysis GO/TiO2/Si MOS junction was performed. Current–voltage (I–V) characteristics of diode were analyzed at 298–398 K. Several parameters such as ideality factor (η), barrier height (… Click to show full abstract
Abstract In this paper electrical analysis GO/TiO2/Si MOS junction was performed. Current–voltage (I–V) characteristics of diode were analyzed at 298–398 K. Several parameters such as ideality factor (η), barrier height ( φ B ), rectification ratio (RR), series and shunt resistances (RS& Rsh) were estimated from I–V plots. The results showed that the MOS junction obeyed the thermionic emission phenomenon. In addition, capacitance – voltage (C–V) were measured at voltage range (−2Vto+2 V), at temperature range of (233–363 K) and at different frequencies. At low frequency 10 Hz revealed that negative capacitance of capacitor. A negative capacitance is due to an inductive behavior of studied materials. Moreover, at higher frequency, f = 2 × 107 Hz, capacitance increases slightly with the increase of temperature and the interface states (Nss) cannot pursue ac signal and gives the geometrical capacitance values.
               
Click one of the above tabs to view related content.