LAUSR.org creates dashboard-style pages of related content for over 1.5 million academic articles. Sign Up to like articles & get recommendations!

Investigation of electrical and capacitance- voltage characteristics of GO/TiO2/n-Si MOS device

Photo from archive.org

Abstract In this paper electrical analysis GO/TiO2/Si MOS junction was performed. Current–voltage (I–V) characteristics of diode were analyzed at 298–398 K. Several parameters such as ideality factor (η), barrier height (… Click to show full abstract

Abstract In this paper electrical analysis GO/TiO2/Si MOS junction was performed. Current–voltage (I–V) characteristics of diode were analyzed at 298–398 K. Several parameters such as ideality factor (η), barrier height ( φ B ), rectification ratio (RR), series and shunt resistances (RS& Rsh) were estimated from I–V plots. The results showed that the MOS junction obeyed the thermionic emission phenomenon. In addition, capacitance – voltage (C–V) were measured at voltage range (−2Vto+2 V), at temperature range of (233–363 K) and at different frequencies. At low frequency 10 Hz revealed that negative capacitance of capacitor. A negative capacitance is due to an inductive behavior of studied materials. Moreover, at higher frequency, f = 2 × 107 Hz, capacitance increases slightly with the increase of temperature and the interface states (Nss) cannot pursue ac signal and gives the geometrical capacitance values.

Keywords: voltage; tio2 mos; capacitance voltage; investigation electrical; capacitance; voltage characteristics

Journal Title: Materials Science in Semiconductor Processing
Year Published: 2020

Link to full text (if available)


Share on Social Media:                               Sign Up to like & get
recommendations!

Related content

More Information              News              Social Media              Video              Recommended



                Click one of the above tabs to view related content.