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Abstract The MoOx-Si heterojunction was demonstrated with MoOx as hole contact layer for visible-light sensor application. The α-MoO3 polycrystalline layer was fabricated with high band gap (~2.91 eV) and high… Click to show full abstract
Abstract The MoOx-Si heterojunction was demonstrated with MoOx as hole contact layer for visible-light sensor application. The α-MoO3 polycrystalline layer was fabricated with high band gap (~2.91 eV) and high transmittance (>75%). The microscale MoOx-Si heterojunction sensor displays great photocurrent under white-light illumination (~10−11 A at extremely low luminance of 40 lx). The rejection ratio is 103 at 1240 lx. Additionally, the MoOx-Si heterojunction sensor shows great repeatability and stability at remarkable low operation voltage (−0.5 V–0 V). The device displays fast recovery with short response time and decay time (both
Journal Title: Materials Science in Semiconductor Processing
Year Published: 2021
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