LAUSR

Abstract Molybdenum nitride thin films are well known for their excellent tribological properties. In the Mo-N system different phases can be formed in dependence of the manufacturing process and the nitrogen content. Within this context, the focus is mainly on cubic γ-MoN0.5 and hexagonal δ-MoN thin films. In this study, metastable cubic MoN0.80–0.92 thin films in a B1-NaCl structure were deposited by means of DC magnetron sputtering, while the bias-voltage and the heating were varied. The influence of the deposition parameters on the morphology and topography was investigated with the aid of SEM. The physical structure was analyzed by means of XRD and the texture was examined by 2D GI-XRD using synchrotron radiation. Through nanoindentation the hardness and the Young's modulus were analyzed and correlated with the texture of the thin films. It was found out that the bias-voltage effects the orientation of the thin films and, accordingly, the hardness as well residual stresses. Shear stresses were found in the MoNx thin films in addition to the normal stress.