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Abstract 0.4 Er3+-doped 90.7 SiO2 – 4.4 P2O5 – 2.3 HfO2 – 1.7 Al2O3 – 0.7 Na2O planar waveguide was fabricated by multi-target rf-sputtering technique starting by massive Er3+-activated P2O5-SiO2-Al2O3-Na2O… Click to show full abstract
Abstract 0.4 Er3+-doped 90.7 SiO2 – 4.4 P2O5 – 2.3 HfO2 – 1.7 Al2O3 – 0.7 Na2O planar waveguide was fabricated by multi-target rf-sputtering technique starting by massive Er3+-activated P2O5-SiO2-Al2O3-Na2O glass. The optical parameters were measured by m-line apparatus operating at 632.8, 1319 and 1542 nm. The waveguide compositions were investigated by Energy Dispersive X-ray Spectroscopy and its morphology analyzed by Atomic Force Microscopy. The waveguide exhibits a single propagation mode at 1319 and 1542 nm with an attenuation coefficient of 0.2 dB/cm in the infrared. The emission of 4I13/2 → 4I15/2 transition of Er3+ ion, with a 28.5 nm bandwidth was observed upon TE0 mode excitation at 514.5 nm. The optical and spectroscopic features of the Er3+-activated parent P2O5-SiO2-Al2O3-Na2O glass were also investigated.
Journal Title: Optical Materials
Year Published: 2017
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