Abstract Thin films of silicon nanocrystals embedded in SiO2 matrices were prepared by annealing a photoresist of hydrogen silsesquioxane. As compared to films made by a common method of annealing… Click to show full abstract
Abstract Thin films of silicon nanocrystals embedded in SiO2 matrices were prepared by annealing a photoresist of hydrogen silsesquioxane. As compared to films made by a common method of annealing SiOx (1
               
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