LAUSR

Abstract There is an increase demand for materials that can be reused or last for longer time to achieve a more sustainable environment, not only in terms of chemical and energy required to produce these products but also the energy required to dispose these materials. In this study, a Schiff base was used as anti-aging compound to reduce the effect of UV light on polystyrene. Schiff base compound 1 was dispersed within polystyrene matrix. The obtained materials were subjected to an accelerated aging process under continuous UV radiation. The effectiveness of the polystyrene film containing Schiff base was compared to a polystyrene (blank) film. Weight loss, scanning electron microscopy, and FTIR spectroscopy tests were performed to confirm that the new polymers had more resistant to UV light.