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Advanced fine line double printing process for manufacturing high efficiency silicon wafer solar cells

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Abstract A double print technology using a front contact screen pattern of high precision ultra-fine line finger openings is demonstrated in this work. It has helped in achieving an absolute… Click to show full abstract

Abstract A double print technology using a front contact screen pattern of high precision ultra-fine line finger openings is demonstrated in this work. It has helped in achieving an absolute cell efficiency gain of over 0.25% compared to conventional single printing process. A suitable silver paste was applied to both single and double printing process resulting in improved results and a lower paste laydown for double printing process. This paper represents the work done after the double print process from trial phase reached a matured level with the correct selection of screen design and paste compatibility to work well with the selected screens. A significant improvement in short circuit current (Isc) of almost 90 mA was realized for double printed cells due to increased print aspect ratio and active area for light absorption.

Keywords: fine line; process; printing process; double printing

Journal Title: Solar Energy
Year Published: 2019

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