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Abstract Atomic Layer Deposition (ALD) is a well-suited technique to prepare thin film heterostructures for solar cell applications. In this work, we explore the feasibility of preparing complete CIGS-type solar… Click to show full abstract
Abstract Atomic Layer Deposition (ALD) is a well-suited technique to prepare thin film heterostructures for solar cell applications. In this work, we explore the feasibility of preparing complete CIGS-type solar cells by ALD, namely the absorber layer, the buffer layer and the transparent conducting oxide window layers, with a focus on using an ultra-thin CIGS-type layer (
Keywords:
cigs type;
deposition ald;
layer;
atomic layer;
layer deposition;
solar cell
Journal Title: Solar Energy Materials and Solar Cells
Year Published: 2019
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Journal Title: Solar Energy Materials and Solar Cells
Year Published: 2019
Link to full text (if available)
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recommendations!