Abstract The nonpolar a-plane p-AlxGa1-xN/GaN superlattices (SLs) were successfully grown with metal organic chemical vapor deposition technology. The surface morphology, carrier concentration, layer thickness, and Al composition for the nonpolar… Click to show full abstract
Abstract The nonpolar a-plane p-AlxGa1-xN/GaN superlattices (SLs) were successfully grown with metal organic chemical vapor deposition technology. The surface morphology, carrier concentration, layer thickness, and Al composition for the nonpolar a-plane p-AlxGa1-xN/GaN SLs were characterized by various kinds of technical tools. It was demonstrated that the thickness of the AlxGa1-xN and GaN layers in SLs was calculated to be 12 and 14.5 nm, respectively and the Al composition of the AlxGa1-xN layers in SLs was around 30%. Meanwhile, the results reveal that the surface morphology and carrier concentration of the nonpolar p-SLs could be improved remarkably with the Al composition-graded AlGaN buffer layer and the Mg-δ-doping process. Consequently, a root mean square value of 0.6 nm and a hole concentration of 4.2 × 1017 cm−3 were achieved.
               
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